Intel 18A node is able to offer up to 25% more yield with the same consumption as Intel 3 node

Intel is committed to its next manufacturing node Intel 18aa node with which it will manufacture its next processors Intel Panther Lake and Intel Xeon 7 that we will possibly see this year. During the VLSI symposium that has been held in Japan, Intel has detailed that the mass production of this node is scheduled for the second half of this year, with figures that reach a 25% more yieldand a consumption that can reduce up to 40%.

The figures offered by the manufacturer indicate that, with a consumption of 1.1 volts, the clock speed can be increased up to 25% retaining the same energy consumption, a figure that can be reduce up to 40% If we reduce consumption to 0.75 v Where the performance It is also seen increased in a 18%. Some figures that are achieved thanks to the technology that combines Gate-Lall-Orund (GAA) transistors along with a Powervia energy supply.

This type of rear energy supply allows reduce steps for interconnection between layers and thus reduce the space to the upper layer. Specifically, cells optimized for performance measure 180 nanometers, while high density measure 160 nanometers. It has been achieved Reduce front metal layers Until 11 and 16 nanometers with Intel 18A, also the separation between layers M1 and M10 is now 32 nanometers.

The EUV technologywhich allows reducing the number of masks necessary by 44%, in addition to simplifying manufacturing with this node.

Intel has also performed tests by comparing the performance of this node with that of the ARM nuclei, where Intel’s with its 18A node offers 15% more yield with the same energy consumption.